Si CBED
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.
Pattern by John Mansfield
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.
Pattern by John Mansfield
A precipitate of M23X6 in a 316 stainless steeel sample. Fringes are the dislcations at the interfaces between the matrix and the precipitate.
Image by John Mansfield
An X-ray energy dispersive spectormetry map recorded using the Silicon K line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield
SEM image of nanotube forests assembled into the likeness of Barack Obama.
Image by Sameh Tawfick
Selected area diffraction pattern of alloy phase with strong structure factor intensity variation in the 00X spots.
Image by John Mansfield
SEM image of porous silicon.
Image by EMAL Staff
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.
Pattern by John Mansfield
There are in fact, two different EMAL Authorization forms, which one you must use is dictated by your institutinal affiliation:
Users from outside the University of Michigan are requested to provide the same information, however, they are also asked to furnish a purchase order to which the usage can be charged. Purchase orders should be made out to "The University of Michigan Electron Microbeam Analysis Laboratory" and mailed or faxed to the laboratory. The User Fees vary depending on the type of user and the time of day that the equipment is used.