Si CBED
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.
Pattern by John Mansfield
HREM image of grains of silicon nitride
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
HREM Twin
Twin detail in alloy foil in HREM.
BF and DF pair of Gamma/Gamma'
Transmission electron microscope bright field (left) and dark field (right) image pair of a thin film of a gamma/gamma' nickel based superalloy.
Image by EMAL Staff
O Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the Oxygen K line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield
SADP
Selected area diffraction pattern of alloy phase with strong structure factor intensity variation in the 00X spots.
Image by John Mansfield
Si CBED
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.
Pattern by John Mansfield
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