O Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the Oxygen K line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield
HREM image of grains of silicon nitride
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
M23X6 Crocodile
A precipitate of M23X6 in a 316 stainless steeel sample. Fringes are the dislcations at the interfaces between the matrix and the precipitate.
Image by John Mansfield
X-ray Composite Map of Chip
An XEDS map of a semiconductor chip, green is the silicon K alpha line, yellow is the gols M alpha line and red the carbon K line.
Image by John Mansfield
Al Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the aluminum K alpha line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield.
BF STEM Image of Copper Aluminum Precipitates
A scanning transmission electron micrograph recorded in a Dualbeam FIB of semi-coherent copper aluminum precipitates in an aluminum alloy.
Image by FEI
O Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the Oxygen K line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield