Al Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the aluminum K alpha line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield.
HREM image of grains of silicon nitride
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
Carbon Nanotubes Modified with an Ultrafast Laser
High magnification SEM image of a carbon nanotube mat modified by shots from a femtosecond laser. Accelerating voltage 2kV.
Image by John Mansfield
CBED of Metal Carbide
Convergent beam electron diffraction pattern of M23X6, a metal carbo-nitro-boride common in steels.
Pattern by John Mansfield
Carbon Nanotubes Modified with an Ultrafast Laser
Low magnification SEM image of a carbon nanotube mat modified by shots from a femtosecond laser. Accelerating voltage 2kV.
Image by John Mansfield
Dislocations in Si-Ge Thin Film
TEM image of dislocations in a silicon and silicon-gremanium thin film system.
Image by John Mansfield
Al Map on Semiconductor Chip
An X-ray energy dispersive spectormetry map recorded using the aluminum K alpha line. Map recorded on the FEI Quanta Dualbeam with an EDAX Apollo 40 Silicon Drift Detector.
Image by John Mansfield.
